Published in J. Vac. Sci. Technol. A 17, 2251 (1999).

Compositional variations in strain-compensated InGaAsP/InAsP superlattices studied by scanning tunneling microscopy

B. Grandidier and R. M. Feenstra
Department of Physics, Carnegie Mellon University, Pittsburgh, PA 15213
C. Silfvenius and G. Landgren
Department of Electronics, Royal Institute of Technology, Kista, Sweden


Cross sectional scanning tunneling microscopy (STM) and scanning tunneling spectroscopy are used to study strain compensated InGaAsP/InAsP superlattices grown by metalorganic vapor phase epitaxy, with or without an InP layer inserted in the InAsP barrier. A difference of contrast in the STM images is observed between the InAsP barrier grown over an InP layer compared with the InAsP barrier grown over the InGaAsP well. The first approx. 4 nm of the InAsP barrier layers grown over the wells are found to be compositionally intermixed, containing significant enrichment of both arsenic and gallium atoms. This intermixing is believed to be due to some carry-over or surface segregation of these species when the growth is switched from well to barrier.

Click here for preprint of paper, in pdf format.

Return to Home Page of Feenstra group