Professor Robert F. Davis et al was selected "outstanding"-Department of Materials Science and Engineering - Carnegie Mellon University

Professor Robert F. Davis et al was selected "outstanding"

A paper by Professor Robert F. Davis with R. I. Barabash, G. E. Ice, W. Liu, S. Einfeldt, D. Hommel, A. M. Roskowski and R. F. Davis, "White X-ray Microbeam Analysis of Strain and Crystallographic Tilt in GaN Layers Grown by Maskless Pendeoepitaxy", Physica Status Solidi (a) 202, 732-738 (2005) was selected by the management of the Advance Photon Source as an "outstanding" result from that facility. This award acknowledges excellence in collaborative research between Davis' student team of scholars (Einfeldt and Roskowski) and those at Oak Ridge National Laboratory (Barabash, Ice and Liu) and the University of Bremen (Einfeldtand Hommel).