Synthesis in this group mostly refers to deposition of thin films and hetero-structures consisting of multiple layers of frequently dissimilar materials.
The workhorse system/method is sputtering where energetic ions strike the target and cause ejection of atoms into the vapor phase. Multiple sputtering systems in the Nanofab and group laboratories allow for deposition of uniform films with as many as 11 different components without breaking vacuum.
High quality crystalline films are deposited by Molecular Beam Epitaxy technique. Deposition in ultra high vacuum let's us monitor the growth processes in situ by Reflection High Energy Electron Diffraction or Mass Spectroscopy.