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Chemical mechanical polishing (CMP) aware design for manufacturability (DFM) in Bit-Patterned Media (BPM)
| To push magnetic storage densities beyond the super paramagnetic limit, new technologies such as bit patterned media (BPM) and heat assisted magnetic recording (HAMR) are being developed by the data storage industry. BPM separates the bit domains to reduce cross talk and improve the thermal stability, thus enabling storage technologies to surpass the superparamagnetic limit. As with the electronic design automation (EDA) industry with computer chips, the PFTL is developing a computational framework to integrate manufacturing process knowledge into the design of BPM. |
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| PFTL Research Assistant(s): |
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Jonatan A. Sierra Suarez; Gagan Srivastava; |
| Method(s) Employed: |
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In situ data acquisition, 3D computational fluid dynamics; ex situ optical interferometry, |
| Rig(s) and/or Software(s) Employed: |
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| Sponsor(s): |
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Sample Results:
Select PFTL References:
Sierra Suarez J.A., Higgs III, C.F. "Planarization-Aware DFM Framework for Bit Patterned Media HDD", Data Storage Systems Center Symposium (DSSC), Carnegie Mellon University, Spring 2012.
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